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The Atomic to Molecular Transition in Galaxies. I: An Analytic Approximation for Photodissociation Fronts in Finite Clouds

机译:星系中的原子到分子跃迁。我:分析师   有限云中光解离前沿的近似

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摘要

In this series of papers we study the structure of the atomic to moleculartransition in the giant atomic-molecular complexes that are the repositories ofmost molecular gas in galaxies, with the ultimate goal of attaining a betterunderstanding of what determines galaxies' molecular content. Here we derive anapproximate analytic solution for the structure of a photodissociation region(PDR) in a cloud of finite size that is bathed in an external dissociatingradiation field. Our solution extends previous work, which with few exceptionshas been restricted to a one-dimensional treatment of the radiation field. Weshow that our analytic results compare favorably to exact numericalcalculations in the one-dimensional limit. However, our more general geometryprovides a more realistic representation than a semi-infinite slab foratomic-molecular complexes exposed to the interstellar radiation field,particularly in environments such as low-metallicity dwarf galaxies where thecurvature and finite size of the atomic envelope cannot be neglected. Forclouds that are at least 20% molecular we obtain analytic expressions for themolecular fraction in terms of properties of the gas and radiation field thatare accurate to tens of percent, while for clouds of lower molecular content weobtain upper limits. As a side benefit, our analysis helps clarify whenself-shielding is the dominant process in H_2 formation, and under whatcircumstances shielding by dust makes a significant contribution.
机译:在这一系列论文中,我们研究了巨大的原子分子复合物中原子到分子的结构,这是星系中大多数分子气体的储存库,其最终目的是更好地了解决定星系分子含量的因素。在这里,我们为沐浴在外部解离辐射场中的有限尺寸云中的光解离区(PDR)的结构推导了一个近似解析解。我们的解决方案扩展了以前的工作,几乎没有例外,这些工作仅限于对辐射场进行一维处理。我们表明,我们的分析结果与在一维范围内的精确数值计算相比具有优势。但是,比起暴露于星际辐射场的半无限平板的原子-分子复合物,我们更通用的几何学提供了更现实的表示,尤其是在诸如低金属性矮星系这样的环境中,其中不能忽略原子包络的曲率和有限尺寸。对于分子至少为20%的云,我们可以根据气体和辐射场的性质获得分子分数的解析表达式,其精确度可达百分之几十,而对于分子含量较低的云,则可以获得上限。作为附带的好处,我们的分析有助于弄清何时自我屏蔽是H_2形成的主要过程,并且在什么情况下被粉尘屏蔽是重要的。

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